Resist Mechanism during the Exposure and Post Exposure Bake Steps for a... | Download Scientific Diagram
Processing: Post-Exposure Bake
Post exposure bake temperature study of 100 nm 1:1 L/S features... | Download Scientific Diagram
Fabrication of a high-resolution mask by using variable-shaped electron beam lithography with a non-chemically amplified resist and a post-exposure bake - ScienceDirect
Application oriented research topic of WIAS - - Modeling and simulation of photoresists