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Recent Progress of Negative-tone Imaging with EUV exposure
Recent Progress of Negative-tone Imaging with EUV exposure

Photolithography 光刻 Part II: Photoresists
Photolithography 光刻 Part II: Photoresists

Ultrasensitive non-chemically amplified low-contrast negative electron beam  lithography resist with dual-tone behaviour - Journal of Materials  Chemistry C (RSC Publishing)
Ultrasensitive non-chemically amplified low-contrast negative electron beam lithography resist with dual-tone behaviour - Journal of Materials Chemistry C (RSC Publishing)

Willson Research Group - Water Soluble Resist
Willson Research Group - Water Soluble Resist

3: Lithographic patterning of positive and negative tone resists (Dark... |  Download Scientific Diagram
3: Lithographic patterning of positive and negative tone resists (Dark... | Download Scientific Diagram

Difference between the positive tone resist on the left and the... |  Download Scientific Diagram
Difference between the positive tone resist on the left and the... | Download Scientific Diagram

Comparative analysis of resist model stability in negative tone development  process | Semantic Scholar
Comparative analysis of resist model stability in negative tone development process | Semantic Scholar

Schematic of a typical contrast curve of a resist. P stands for... |  Download Scientific Diagram
Schematic of a typical contrast curve of a resist. P stands for... | Download Scientific Diagram

Patterning | Merck
Patterning | Merck

Photoresist - Wikipedia
Photoresist - Wikipedia

Tuning the Performance of Negative Tone Electron Beam Resists for the Next  Generation Lithography - Lewis - 2022 - Advanced Functional Materials -  Wiley Online Library
Tuning the Performance of Negative Tone Electron Beam Resists for the Next Generation Lithography - Lewis - 2022 - Advanced Functional Materials - Wiley Online Library

Photoresists AZ and MicroChemicals TI resists
Photoresists AZ and MicroChemicals TI resists

ma-N 2400 series – Microresist
ma-N 2400 series – Microresist

Photoresist - YouTube
Photoresist - YouTube

2.6.1 Contrast and Important Properties
2.6.1 Contrast and Important Properties

Chemical shrink materials and process for negative tone development (NTD)  resist
Chemical shrink materials and process for negative tone development (NTD) resist

RaymondNCo
RaymondNCo

Comparing positive and negative tone development process for printing the  metal and contact layers of the 32- and 22-nm nodes
Comparing positive and negative tone development process for printing the metal and contact layers of the 32- and 22-nm nodes

Negative-tone molecular glass photoresist for high-resolution electron beam  lithography | Royal Society Open Science
Negative-tone molecular glass photoresist for high-resolution electron beam lithography | Royal Society Open Science

Electron beam lithography of HSQ/PMMA bilayer resists for negative tone  lift-off process - ScienceDirect
Electron beam lithography of HSQ/PMMA bilayer resists for negative tone lift-off process - ScienceDirect

Study of Electron Beam Resists: Negative Tone HSQ and Positive Tone SML300  - E+E Scientific Journal
Study of Electron Beam Resists: Negative Tone HSQ and Positive Tone SML300 - E+E Scientific Journal

PDF) Comparison of negative tone resists NEB22 and UVN30 in e-beam  lithography | Falco C M J M van Delft - Academia.edu
PDF) Comparison of negative tone resists NEB22 and UVN30 in e-beam lithography | Falco C M J M van Delft - Academia.edu

Negative-tone molecular glass photoresist for high-resolution electron beam  lithography | Royal Society Open Science
Negative-tone molecular glass photoresist for high-resolution electron beam lithography | Royal Society Open Science

Resist contrast curves for positive and negative tone imaging with... |  Download Scientific Diagram
Resist contrast curves for positive and negative tone imaging with... | Download Scientific Diagram

Positive vs. Negative Tone Photoresists
Positive vs. Negative Tone Photoresists

Optical lithography - Book chapter - IOPscience
Optical lithography - Book chapter - IOPscience

Comparison of positive tone versus negative tone resist pattern collapse  behavior: Journal of Vacuum Science & Technology B: Vol 28, No 6
Comparison of positive tone versus negative tone resist pattern collapse behavior: Journal of Vacuum Science & Technology B: Vol 28, No 6

Hexafluoroalcohol-functionalized Methacrylate Monomers for  Lithographic/nanopatterning materials
Hexafluoroalcohol-functionalized Methacrylate Monomers for Lithographic/nanopatterning materials